Page 130 - ELT_15th July 2020_Vol 373_Part 2
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E40                         EXCISE LAW TIMES                    [ Vol. 373

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                                            note bene  ified by 8B301 .g. and  designed 8b301.g. and  designed to be used
                                             added   to be used by lithography by lithography equipment having a
                                                     equipment having a light source light source wavelength less than
                                                     wavelength less than 245 nm;   245 nm;
                                                     Note 8B301.h. does not apply to Note 8B301.h. does not apply to mul-
                                                     multi-layer masks with a  phase ti-layer masks with a phase shift layer
                                                     shift layer designed for the fab- designed for the fabrication of memory
                                                     rication of memory devices  not devices not specified by 8A301.
                                                     specified by 8A301.        N.B. For masks and reticles, specially
                                                                                designed  for optical sensors, see
                                                                                8B602.
                                       28.   Change in  8D303 ‘Physics-based’  simula- 8D303 ‘Computational lithogra-
                                           8D303 and  tion “software” specially  de- phy’ “software” specially designed
                                            old tech-  signed for the “development” of for the “development” of patterns
                                            nical note  lithographic, etching or deposi- on EUV-lithography masks or reti-
                                           deleted new  tion processes for translating cles.
                                            technical  masking  patterns into specific Technical Note
                                             added   topographical  patterns in con-  ‘Computational lithography’ is the use
                                                     ductors, dielectrics or semicon-  of computer modelling to predict, cor-
                                                     ductor materials.          rect, optimise and verify imaging per-
                                                     Technical Note             formance of the  lithography  process
                                                     ‘Physics-based’ in 8D303 means over a range of patterns, processes, and
                                                     using computations to determine a system conditions.
                                                     sequence of physical cause and effect
                                                     events based on physical properties
                                                     (e.g., temperature, pressure, diffu-
                                                     sion constants and semiconductor
                                                     materials properties).
                                                     Note
                                                     Libraries, design attributes or asso-
                                                     ciated data for  the design of semi-
                                                     conductor devices or integrated
                                                     circuits are considered as “technol-
                                                     ogy”.
                                       29.   Change in  8E302                   8E302
                                           note 2 and 3  a.   A ‘vector processor unit’ a.   A  ‘vector processor unit’ de-
                                            and tech-     designed to  perform more   signed to perform more than
                                           nical note is   than two calculations on   two calculations on ‘floating-
                                            added to      floating-point vectors (one-  point’  vectors  (one-
                                             8E302        dimensional arrays of 32-  dimensional arrays of 32-bit
                                                          bit or larger numbers)     or larger numbers) simulta-
                                                          simultaneously;            neously;
                                                          Technical Note             Technical Note
                                                          A ‘vector processor unit’ is a   A ‘vector  processor unit’ is  a
                                                          processor element with built-  processor element with built-in
                                                          in instructions that  perform   instructions that perform multi-
                                                          multiple calculations on float-  ple calculations on ‘floating-
                                                          ing-point        vectors   point’ vectors (one-dimensional
                                                          (one-dimensional arrays of   arrays of 32-bit or larger num-
                                                          32-bit  or  larger     numbers)   bers) simultaneously, having  at
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